Laser anneal apparatus

A laser anneal apparatus which irradiates a substrate to be treated with laser light to anneal the surface of the substrate, comprising:

• a laser source;
• a homogenizing optical system disposed in an optical path of the laser light emitted from the laser source to homogenize an intensity distribution of the laser light in a section which is perpendicular to the optical path;
• an optical device disposed in the optical path of the laser light passed through the homogenizing optical system to produce an intensity distribution pattern of the laser light in the section which is perpendicular to the optical path;
• a photoreceptor device disposed in the optical path of the laser light passed through the optical device to intercept a part of the laser light and to measure a quantity of the intercepted laser light;
• and
• an image-forming optical system disposed in the optical path of the laser light passed through the photoreceptor device to focus the laser light on the substrate to be treated.