Level sensor, lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsAnastasius Jacobus Bruinsma, Frank Staals, Robert Wijk, Stoyan Nihtianov
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AssigneeASML Netherlands B.V.
InventorsAnastasius Jacobus Bruinsma, Frank Staals, Robert Wijk, Stoyan Nihtianov
Estimating the term…
The invention relates to a level sensor for use in a lithographic apparatus that determines a surface height of a substrate. The level sensor includes an emitter and a receiver, wherein the emitter is arranged to emit a signal directed to a predetermined position on the surface of the substrate, such that the signal is at least partially reflected by the substrate to render a reflected signal. The receiver is arranged to receive at least part of the reflected signal, and the level sensor is arranged to determine the surface height of the substrate with respect to the level sensor based on the emitted and received signal. The signal includes a pressure wave.
A level sensor for use in a lithographic apparatus to determine a height of a surface of a substrate, the level sensor comprising:
A lithographic apparatus, comprising:
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate, wherein the lithographic projection apparatus includes a level sensor comprising:
A method of determining a height of a surface of a substrate using a level sensor that includes an emitter and a receiver, the method comprising:
Dependencies are inferred from the claim text.