Method for determining the focal position of a laser beam
AssigneeSiemens Aktiengesellschaft
InventorsDirk Hillebrand, Hans Mayer, Christian Overmann
Life of this patent
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Abstract
Disclosed is a method for determining the focal position of a laser beam, according to which a plurality of linear patterns are first created on the surface of a sample substrate by the laser beam, the distance between the laser and the substrate surface being gradually modified. The width of the individual lines is then measured and the line having the smallest width is determined. The vertical setting associated with the smallest line width is evaluated and stored as the focal setting of the machine.
Claims7
A method for determining a focal position of a laser beam in a machine for processing substrates comprising the steps of:
- generating a plurality of linear patterns on a planar surface of a sample substrate by means of the laser beam, such that a distance between an imaging unit of the laser beam and of the planar substrate surface is gradually modified,
- storing associated distance value for each pattern created,
- measuring line width of all patterns and assigning measured line width values to respective distance values, and
- determining a pattern with the smallest line width, and identifying an associated distance value as a focal setting of the laser beam.
Dependencies are inferred from the claim text.