Semiconductor manufacturing apparatus and manufacturing method of semiconductor device

A manufacturing method of a semiconductor device, comprising:

• conveying a substrate by a robot arm into a treatment chamber in which an electrode is disposed and a focus ring having a detection pattern is disposed on an outer peripheral edge portion of the electrode;
• adjusting clearance between the substrate and the focus ring by detecting the detection pattern of the focus ring by a sensor provided at the robot arm and adjusting a position of the robot arm based on the detection result of the sensor;
• placing the substrate on the electrode while keeping the adjusted clearance;
• and
• performing plasma treatment for the substrate placed on the electrode.

A manufacturing method of a semiconductor device, comprising:

• conveying a substrate by a robot arm into a treatment chamber in which an electrode is disposed and a focus ring having a detection pattern is disposed on an outer peripheral edge portion of the electrode;
• placing the substrate on the electrode so that the substrate and the focus ring are partially overlay each other and an outer periphery of the substrate is along the detection pattern of the focus ring;
• estimating actual positional relationship between the substrate and the focus ring by detecting the detection pattern of the focus ring in the state in which the substrate is placed on the electrode;
• and
• performing plasma treatment for the substrate placed on the electrode.