Back to results
US 2006/0137612 A1Published application
Methods and apparatus for downstream dissociation of gases
AssigneeMKS Instruments, Inc.
InventorsWilliam Holber, Xing Chen
Life of this patent
Estimating the term…
Abstract
A method and apparatus for activating and dissociating gases involves generating an activated gas with a plasma located in a chamber. A downstream gas input is positioned relative to an output of the chamber to enable the activated gas to facilitate dissociation of a downstream gas introduced by the gas input, wherein the dissociated downstream gas does not substantially interact with an interior surface of the chamber.
Claims15
A method for depositing a material on a substrate, comprising:
- generating an activated gas with a plasma in a chamber;
- and
- positioning a downstream gas input relative to an output of the chamber to enable the activated gas to facilitate dissociation of a downstream gas which is introduced by the gas input, wherein the downstream gas comprises a material to be deposited, and wherein the dissociated downstream gas does not substantially interact with an interior surface of the chamber.
A system for depositing a material on a substrate, comprising:
- a remote plasma source for generating a plasma region in a chamber, wherein the plasma generates an activated gas;
- and
- an injection source for introducing a downstream gas, comprising a deposition material, to interact with the activated gas outside the plasma region, wherein the activated gas facilitates excitation of the downstream gas, and wherein the excited downstream gas does not substantially interact with an interior surface of the chamber.
Dependencies are inferred from the claim text.