Semiconductor laser device of III-V group compound and fabrication method therefor
AssigneeSharp Kabushiki Kaisha
InventorHiroyuki Hosoba
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Abstract
A semiconductor laser device of a III-V group compound includes a substrate including a main surface having an inclination angle of less than 20° toward a [011] direction from a (100) plane and an inclined facet further inclined toward the [011] direction from the main surface, a light emitting stacked-layered portion including at least an active layer and a clad layer over the substrate, and a current-constricting layer including a IV group impurity. The current-constricting layer has a region of an n type conductivity above the main surface of the substrate, and a region of a p type conductivity above the inclined facet of the substrate.
Claims4
1-10. (canceled)
A method of fabricating a semiconductor laser device of a III-V group compound, wherein a light emitting stacked-layered portion including at least an active layer and a clad layer, and a current-constricting layer including a IV group impurity, are grown by molecular beam epitaxy over a substrate including a main surface having an inclination angle of less than 20° toward a [011] direction from a (100) plane and an inclined facet further inclined toward the [011] direction from the main surface,
- said current-constricting layer including a region of an n type conductivity above said main surface and a region of a p type conductivity above said inclined facet.
Dependencies are inferred from the claim text.