Method of producing a diffraction grating
AssigneeSumitomo Electric Industries, Ltd.
InventorTakeshi Kishi
Life of this patent
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Abstract
In an embodiment, a method of producing a diffraction grating comprises steps of: forming, on a man surface of a first member, a first mask having a plurality of resist patterns arranged at a Bragg diffraction period; etching the first member by use of the first mask, thereby providing the first member with a diffraction grating; removing the first mask; forming, on the diffraction grating, a second member of which an etching rate is lower than that of the first member; forming a second mask on a first region in a surface of the second member, the first region and a second region in the surface being adjacent to each other; and etching the first member and the second member by use of the second mask.
Claims16
A method of producing a diffraction grating comprising:
- a first mask forming step of forming, on a main surface of a first member, a first mask having a plurality of resist patterns arranged at a Bragg diffraction period in a direction along the main surface;
- a first etching step of etching the first member by use of the first mask formed in the first mask forming step, thereby providing the first member with a diffraction grating;
- a first mask removing step of removing the first mask after the first etching step;
- a second member forming step of forming a second member of which an etching rate is lower than that of the first member, on the diffraction grating after the first mask removing step;
- a second mask forming step of forming a second mask on a first region in a surface of the second member, the first region and a second region in the surface being adjacent to each other in the direction;
- a second etching step of etching the first member and the second member by use of the second mask formed in the second mask forming step;
- a second mask removing step of removing the second mask after the second etching step;
- and
- a second member removing step of removing the second member after the second mask removing step.
A method of producing a diffraction grating comprising:
- a first mask forming step of forming, on a main surface of a first member, a first mask having a plurality of resist patterns arranged at a Bragg diffraction period in a direction along the main surface;
- a first etching step of etching the first member by use of the first mask formed in the first mask forming step, thereby providing the first member with a diffraction grating;
- a first mask removing step of removing the first mask after the first etching step;
- a second member forming step of forming a second member of which an etching rate is lower than that of the first member, on the diffraction grating after the first mask removing step;
- a second mask forming step of forming a second mask on a first region in the surface of the second member, the first region and a second region being adjacent to each other in the direction;
- a second member removing step of removing the second member under the second region after the second mask forming step;
- a second mask removing step of removing the second mask after the second member removing step;
- and
- a second etching step of etching the first member and the second member after the second mask removing step.
Dependencies are inferred from the claim text.