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US 2006/0134562 A1Published application
Method of forming micro-pattern
AssigneeIndustrial Technology Research Institute
InventorsChin-Tai Chen, Ching-Long Chiu, Ji-Bin Horng
Life of this patent
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Abstract
A method of forming a micro pattern. The method comprises the following steps: providing a substrate; forming a first micro-fluid layer of photo resistant material on the substrate; providing a first photo mask; and exposing the first micro-fluid layer to light via the first photo mask to form a micro pattern. The dimension of the first micro-fluid layer is larger than that of the micro pattern.
Claims11
A method of forming a micro pattern, comprising the following steps:
- providing a substrate;
- forming a first micro-fluid layer of photo resistant material on the substrate;
- providing a first photo mask;
- and
- exposing the first micro-fluid layer to illuminate via the first photo mask to form a micro pattern.
2 more elements
A method of forming a micro pattern, comprising the following steps:
- providing a substrate;
- forming a plurality of micro-fluid layers corresponding to various photo resistant materials with different colors in different positions on the substrate;
- providing a photo mask;
- and
- exposing the micro-fluid layers to illuminate via the photo mask to form micro patterns.
2 more elements
Dependencies are inferred from the claim text.