Methods and compositions for forming aperiodic patterned copolymer films
AssigneeWisconsin Alumni Research Foundation
InventorsPaul Nealey, SangOuk Kim, Erik Edwards, Mark Stoykovich, Juan de Pablo
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AssigneeWisconsin Alumni Research Foundation
InventorsPaul Nealey, SangOuk Kim, Erik Edwards, Mark Stoykovich, Juan de Pablo
Estimating the term…
The present invention provides improved and compositions methods for replicating substrate patterns including patterns containing irregular features. The methods of the invention involve depositing block copolymer materials on a patterned substrate and ordering components in the material to replicate the pattern. In some embodiments, ordering is facilitated through the use of blends of the copolymer material and/or configuring substrate patterns so that regions of the substrate pattern interact in a highly preferential manner with at least one of the components in the copolymer material. The invention also provides compositions containing a substrate pattern with irregular features replicated in a block copolymer material.
A method of forming copolymer structures, comprising:
A method of forming copolymer structures, comprising:
A method of forming copolymer structures, comprising:
A composition comprising:
Dependencies are inferred from the claim text.