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US 2006/0134535 A1Published application
Lensed fiber array for sub-micron optical lithography patterning
Assignee3M Innovative Properties Company
InventorJerome Porque
Life of this patent
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Abstract
In accordance with various embodiments, there is an exposure system for writing a pattern on a photosensitive material. The exposure system can include a waveguide array and a light modulator. The waveguide array can include a plurality of optical fibers that focuses light on the radiation sensitive material. The light modulator can modulate the light coupled into the plurality of optical fibers. Exemplary exposure systems can reduce aberrations due to coma and distortion, and provide improved alignment.
Claims27
An exposure system comprising:
- a waveguide array that guides light to pattern a radiation sensitive material, wherein the waveguide array comprises a plurality of waveguides;
- and
- a light modulator to independently modulate light coupled into the plurality of waveguides of the waveguide array.
A lithography system comprising:
- a light source that provides an ultraviolet (UV) light;
- an optical element that modulates the UV light;
- a waveguide array comprising a plurality of waveguides to guide the modulated UV light;
- and
- a stage disposed to move a substrate relative to the waveguide array.
2 more elements
A method for lithography comprising:
- coupling a modulated light into a plurality of optical fibers;
- focusing the modulated light onto a photosensitive material disposed on a substrate using the plurality of optical fibers;
- and
- writing a desired pattern in the photosensitive material by at least one of translating and rotating the substrate relative to the plurality of optical fibers.
1 more element
Dependencies are inferred from the claim text.