Coat/develop module with independent stations

A method of dispensing a fluid onto a semiconductor substrate using an apparatus comprising a dispense nozzle, a first processing chamber, a second processing chamber, and a dispense arm access shutter positioned between the first and second processing chambers, the method comprising:

• opening the dispense arm access shutter;
• moving the dispense nozzle to a first position in the first processing chamber;
• dispensing a fluid from the dispense nozzle;
• moving the dispense nozzle to a second position between the first and second processing chamber;
• and
• closing the dispense arm access shutter.

A controlled environment apparatus for dispensing fluid during semiconductor substrate processing operations, the controlled environment apparatus comprising:

• a first processing chamber;
• a second processing chamber;
• a dispense arm assembly having a home position;
• and
• a first dispense arm access shutter positioned between the home position and the first processing chamber;
• a second dispense arm access shutter positioned between the home position and the first processing chambers, wherein a first temperature in the first processing chamber and a second temperature in the second processing chamber are independently controlled.

A track lithography tool comprising:

• a front end module adapted to receive FOUPs containing a plurality of substrates;
• a central module comprising a plurality of processing tools;
• a rear module coupled to a scanner;
• and
• at least one robot adapted to receive a substrate from the front end module and deliver the substrate to either a processing tool and/or the rear module, wherein one of the plurality of processing tools is an apparatus for dispensing fluid during semiconductor substrate processing operations, the apparatus comprising:
• a first processing chamber;
• a second processing chamber;
• a dispense arm assembly;
• and
• a dispense arm access shutter positioned between the first and second processing chambers and moveable between an open and a closed position, wherein the dispense arm assembly can travel from the first processing chamber to the second processing chamber when the dispense arm assembly is in the open position.