Process and apparatus for removing Bronsted acid impurities in binary halides
AssigneeVoltaix, Inc.
InventorsLeisl Dukhedin-Lalla, German Shekk, John de Neufville, Michael Pikulin
Life of this patent
Estimating the term…
Abstract
A process and apparatus is provided for the purification of binary halide fluid. The process and apparatus purifies the binary halide fluid by selectively removing Bronsted acid impurities and/or volatile oxygen containing impurities present in the binary halide. A regenerable adsorbent polymer is utilized to remove the Bronsted acid impurities from the binary halide fluid and a volatile oxide adsorbent having a specific adsorption capacity for the volatile oxide impurity is utilized to remove the volatile oxide from the binary halide when in gaseous form.
Claims45
A process for removing hydrochloric acid impurities present in a binary halide fluid comprising:
- contacting the binary halide fluid with a regenerable adsorbent polymer, having incorporated in its structure a moiety having a basicity so that when incorporated into the polymer, the polymer is capable of adsorbing and retaining hydrochloric acid to selectively remove at least a portion of the hydrochloric acid impurities from the binary halide fluid.
A process for removing hydrochloric acid present as an impurity in silicon tetrafluoride fluid comprising:
- contacting the impurity containing silicon tetrafluoride fluid with an adsorbent polymer having incorporated in its chemical structure a moiety having a basicity so that when incorporated into the polymer the polymer is capable of adsorbing the hydrochloric acid to selectively remove at least a portion of the hydrochloric acid from the silicon tetrafluoride fluid.
A process for removing hydrochloric acid impurities present in a binary halide fluid comprising:
- providing a binary halide fluid comprising a binary halide, hydrochloric acid, and optionally a volatile oxide impurity consisting essentially of CO2, CO, oxides of nitrogen, oxides of sulfur, siloxanes, aldehydes, ketones, alcohols, and mixtures thereof;
- contacting the binary halide fluid with a regenerable adsorbent polymer, having incorporated in its structure a moiety having a basicity so that when incorporated into the polymer, the polymer is capable of adsorbing and retaining hydrochloric acid to remove at least a portion of the hydrochloric acid impurities from the binary halide fluid.
(canceled)
Dependencies are inferred from the claim text.