# US 2006/0133569 A1 · Method for manufacturing a reflector for X-ray radiation > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2006/0133569 A1 - Document ID: US20060133569A1 - Status: Published application - Kind: A1 - Application number: 11/290,545 - Filed: 2005-12-01 - Published: 2006-06-22 - Earliest claimed: 2002-11-20 - Assignees: incoatec GmbH - Inventors: Carsten Michaelsen; Michael Dahms - Web page: https://patentgrep.com/patent/US20060133569A1 ## CPC - G21K 1/06: using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) - G21K: HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES ## Abstract A method for manufacturing a reflector (5) for X-ray radiation (2, 3, 10, 11) which is curved in a non-circular arc shape, along a first cross-section (13) in a plane (XZ) which contains a x-direction, wherein the reflector (5) is also curved along a second cross-section (14) in a plane (YZ) which is perpendicular to the x-direction, is characterized in that the reflector (5) has a curvature along the second cross-section (14) which also differs from the shape of a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates production of X-ray mirrors and at the same time provides high reflection capacity and good focusing properties for X-ray mirrors. ## Claims ### Claim 1 A method for manufacturing a reflector for X-ray radiation having a curved substrate and a multi-layer coating deposited on the substrate, the method comprising the steps of: a) determining a first non-circular arc shape for the substrate along a first cross-section, extending in an XZ plane containing an X direction; b) determining a geometry for coating said substrate with a desired coating dependence in the X direction; c) determining a deviation from a desired coating dependence in a YZ plane perpendicular to the X direction resulting from the geometry selected in step b); d) determining a second non-circular arc shape for the substrate along a second cross section, extending in the YZ plane to compensate for the deviation determined in step c); and e) producing the mirror following steps a) to d). ### Claim 2 (depends on 1) The method of claim 1, wherein the second arc shape of the reflector along the second cross section defines focusing properties of the reflector. ### Claim 3 (depends on 2) The method of claim 2, wherein the focusing properties are within the YZ plane. ### Claim 4 (depends on 1) The method of claim 1, wherein the first and the second arc shapes focus or render parallel in two-dimensions. ### Claim 5 (depends on 1) The method of claim 1, wherein the first arc shape is parabolic, hyperbolic, or elliptical along the first cross-section. ### Claim 6 (depends on 1) The method of claim 1, wherein the multi-layer coating comprises a periodically repeating sequence of layers of materials A, B, . . . with different refractive indices, wherein a sum d=dA+dB+ . . . of thicknesses dA, dB . . . of successive layers of the materials A, B, . . . changes continuously along the X-direction. ### Claim 7 (depends on 6) The method of claim 6, wherein the sum changes monotonically. ### Claim 8 (depends on 7) The method of claim 7, wherein the sum changes along the second cross-section. ### Claim 9 (depends on 8) The method of claim 8, where the sum changes by more than 2%. ### Claim 10 (depends on 8) The method of claim 8, wherein a curvature of the reflector along the second cross-section compensates for a change in said sum d along the second cross-section by differing from a comparable reflector with a constant sum d and circular curvature along a respective second cross-section thereof for given focusing and reflectivity properties of the reflector. ### Claim 11 (depends on 1) The method of claim 1, wherein the second arc shape has an elliptical curvature of different lengths of semi-axes along the second cross-section. ### Claim 12 (depends on 1) The method of claim 1, wherein the second arc shape has a parabolic curvature along the second cross section. ### Claim 13 (depends on 1) The method of claim 1, wherein the reflector has a reflecting surface width of more than 2 mm as measured perpendicular to the X-direction. ### Claim 14 (depends on 13) The method of claim 13, wherein the width is at least 4 mm. ### Claim 15 (depends on 1) An X-ray analysis device comprising an X-ray source, an X-ray detector, optical shaping and/or delimiting means and the reflector produced by the method of claim 1. ### Claim 16 (depends on 15) The X-ray analysis device of claim 15, wherein X-ray radiation impinges on the reflector at an angle of less than 5° with respect to the X-direction. ### Claim 17 (depends on 15) The X-ray analysis device of claim 15, wherein a curvature of the reflector along the second cross-section is formed such that a reflectivity of the reflector is maximum for a wavelength of radiation generated by said X-ray source. ### Claim 18 (depends on 15) The X-ray analysis device of claim 15, wherein the reflector focuses X-ray radiation impinging thereon to a focal spot. ### Claim 19 (depends on 18) The X-ray analysis device of claim 18, wherein the focal spot is on a sample or on the X-ray detector. ### Claim 20 (depends on 15) The X-ray analysis device of claim 15, wherein the reflector generates a reflected X-ray beam with a certain ray divergence from X-ray radiation impinging thereon. ### Claim 21 (depends on 20) The X-ray analysis device of claim 20, wherein the certain ray divergence generates parallel rays. ### Claim 22 (depends on 1) A reflector produced by the method of claim 1. ### Claim 23 (depends on 4) A reflector produced by the method of claim 4. ### Claim 24 (depends on 10) A reflector produced by the method of claim 10.