Phase-change RAM containing AIN thermal dissipation layer and TiN electrode
AssigneeKorea Institute of Science and Technology
InventorsSeong-Il Kim, Yong-Tae Kim, Young-Hwan Kim, Chun-Keun Kim, Min-Soo Youm
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AssigneeKorea Institute of Science and Technology
InventorsSeong-Il Kim, Yong-Tae Kim, Young-Hwan Kim, Chun-Keun Kim, Min-Soo Youm
Estimating the term…
Provided is a phase-change RAM containing a substrate, a lower electrode, a phase-change material, an upper electrode and a thermal dissipation layer, wherein the thermal dissipation layer contains an aluminum-nitride thermal dissipation layer having a high heat conductivity, and the lower electrode contains a titanium-nitride electrode which generates a great amount of heat generated using a small amount of current and has a low heat conductivity, whereby heat generated between the phase-change material and the electrode is not transferred to the interior of a device but fast dissipated to the exterior thereof, so as to enable a high speed operation using low current and improve reliability of the device.
A phase-change Random Access Memory (RAM), in a phase-change RAM containing a substrate, a lower electrode, a phase-change material, an upper electrode and a thermal dissipation layer, wherein the thermal dissipation layer contains an AlN (aluminum nitride), and the lower electrode contains a TiN (titanium nitride).
A phase-change memory, comprising:
A phase-change memory, comprising:
Dependencies are inferred from the claim text.