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US 2006/0132742 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherland B.V.
InventorsKarel Van Der Mast, Kars Troost
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Abstract
A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and a throughput of the system optimized.
Claims12
A lithographic apparatus comprising:
- an illumination system that conditions a radiation beam;
- an array of individually controllable elements that pattern the beam;
- and
- a projection system that projects the patterned beam onto a target portion of a substrate,
- wherein the projection system can project the radiation beam at a plurality of different magnifications.
2 more elements
A system, comprising:
- a pattern generator that patterns a beam of radiation produced by an illumination system;
- and
- a transferring device that transfers the patterned beam onto a substrate and projects the patterned beam at a plurality of significantly different magnifications.
A lithographic apparatus, comprising:
- an illumination system that conditions a radiation beam;
- an array of individually controllable elements that pattern the beam;
- and
- a projection system that projects the patterned radiation beam onto a target portion of a substrate at a first magnification, wherein the projection system projects the patterned beam onto another target portion of the substrate at a second magnification, the second magnification being substantially 1/n, wherein n is any positive integer.
1 more element
A device manufacturing method, comprising:
- using an array of individually controllable elements to pattern a radiation beam;
- projecting the patterned beam of radiation at a first magnification onto a target portion of a substrate;
- and
- projecting the patterned beam of radiation at a second magnification onto another target portion of the substrate, wherein the first magnification is significantly different from the first magnification.
1 more element
Dependencies are inferred from the claim text.