Exposure apparatus, and device manufacturing method
AssigneeNikon Corporation
InventorAkimitsu Ebihara
Life of this patent
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Abstract
A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
Claims32
A lithographic projection apparatus comprising:
- an illumination system arranged to condition a radiation beam;
- a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;
- a substrate table configured to hold a substrate;
- a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;
- a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising a member;
- and
- a liquid seal device configured to form a liquid seal between the member and the substrate.
A lithographic projection apparatus comprising:
- an illumination system arranged to condition a radiation beam;
- a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;
- a substrate table configured to hold a substrate;
- a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;
- a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising a member, wherein the member comprises a liquid inlet located on a surface of the member which faces the substrate, and
- a sensor configured to establish the position of the member.
A device manufacturing method comprising:
- providing a liquid to a space between a projection system of a lithographic apparatus and a substrate, the space being bounded at least in part by a member;
- forming a liquid seal between the substrate and the member;
- and
- projecting a patterned radiation beam, using the projection system, through the liquid onto a target portion of the substrate.
A device manufacturing method comprising:
- providing a liquid to a space between a projection system of a lithographic apparatus and a surface of the substrate, the liquid being provided via a liquid inlet provided on a member, the liquid inlet facing the surface of the substrate;
- projecting a patterned radiation beam, using the projection system, through the liquid onto a target portion of the substrate;
- and
- establishing a distance between a surface of the substrate and the member.
Dependencies are inferred from the claim text.