Exposure apparatus, method for producing device, and method for controlling exposure apparatus

An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects an image of a pattern through the liquid onto the substrate;
• and
• an electric unit, wherein:
• supply of electric power to the electric unit is stopped when any abnormality is detected to avoid any electric leakage due to adhesion of the liquid.

An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects an image of a pattern through the liquid onto the substrate;
• and
• a suction port which is communicated with a suction system, wherein:
• suction through the suction port is stopped when any abnormality is detected to avoid any inflow of the liquid.

An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects an image of a pattern through the liquid onto the substrate;
• a suction port which is communicated with a suction system;
• a separator which separates gas from the liquid sucked through the suction port;
• and
• a drying unit which dries the gas separated by the separator.

An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

• a substrate stage which is movable while holding the substrate and which has a first area thereon;
• a projection optical system which projects an image of a pattern onto the substrate, which includes an end portion disposed on an image plane side, and which has a second area which is opposed to the first area to retain the liquid between at least a part of the first area and the second area;
• and
• a control unit which restricts movement of the substrate stage depending on positional relationship between the first area and the second area.

An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects an image of a pattern through the liquid onto the substrate;
• a substrate stage which is movable while holding the substrate;
• a base member which movably supports the substrate stage;
• a first detector which is provided for the substrate stage and which detects the liquid;
• a second detector which is provided for the base member and which detects the liquid;
• and
• a control unit which controls operation of the exposure apparatus depending on detection results of the first detector and the second detector.

An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects an image of a pattern onto the substrate;
• a liquid supply mechanism which supplies the liquid to a space between the projection optical system and the substrate;
• a substrate stage which is movable while holding the substrate;
• and
• a control unit which restricts a movement range of the substrate stage to be a first range during the supply of the liquid by the liquid supply mechanism and which restricts the movement range of the substrate stage to be a second range that is wider than the first range during stop of the supply of the liquid by the liquid supply mechanism.

An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects an image of a pattern onto the substrate;
• a liquid supply mechanism which supplies the liquid to an image plane side of the projection optical system;
• a stage which is movable on the image plane side of the projection optical system;
• and
• a control unit which controls a movement range of the stage, wherein:
• the control unit restricts the movement range of the stage, which is adopted when the liquid is retained between the projection optical system and the stage, to be narrower than that of the stage which is adopted when the liquid is not retained between the projection optical system and the stage.

A method for controlling an exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus being provided with components including a projection optical system which projects an image of a pattern onto the substrate, a liquid supply mechanism which supplies the liquid to an image plane side of the projection optical system, a unit which uses electric energy as driving force, and a unit which serves to suck gas, and the exposure apparatus being connected to an external related unit, the method for controlling the exposure apparatus comprising:

• supplying the liquid to the image plane side of the projection optical system;
• receiving a signal notifying any abnormality from at least one of the components and the external related unit;
• and
• restricting operation of at least one of the liquid supply mechanism, the unit which uses the electric energy as the driving force, and the unit which serves to suck the gas, on the basis of the received signal.