Device for generating and/or influencing electromagnetic radiation from a plasma
AssigneeQimonda AG
InventorsSiegfried Schwarzl, Stefan Wurm
Life of this patent
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Abstract
A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects EUV-radiation for EUV-lithography. In a first example, a magnetic means (10) generates at least one inhomogeneous magnetic field (11) and is provided as means for the targeted screening of at least one surface of the device (1; 5; 12) and/or another component (5; 12) from the charge carriers in the plasma (3).
Claims21
A device for generating and/or influencing electromagnetic radiation from a plasma for the lithographic fabrication of semiconductor components, the device comprising:
- a magnetic field generator that generates at least one inhomogeneous magnetic field for the targeted shielding of at least one component of the device from charge carriers of the plasma, the magnetic field generator being arranged in and/or on the component of the device and the gradient of the inhomogeneous magnetic field pointing essentially from the plasma to the component.
An apparatus for lithographic fabrication of semiconductor components, the apparatus comprising:
- a plasma radiation source;
- and
- a magnetic field generator encircling the plasma radiation source, wherein the magnetic field generator provides an inhomogeneous magnetic field.
A semiconductor fabrication method, the method comprising:
- forming a plasma inside a lithography device;
- forming a magnetic field gradient inside the lithography device by using a magnetic field generator that surrounds the lithography device;
- deflecting plasma radiation away from a surface of the lithography device using the magnetic field gradient;
- and
- patterning a substrate while deflecting plasma radiation.
Dependencies are inferred from the claim text.