Monolithic microwave integrated circuit compatible FET structure
AssigneeRaytheon Company
InventorRoberto Alm
Life of this patent
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Abstract
A field effect transistor structure includes a single crystal substrate having: a source, gate and drain electrodes disposed on an upper surface of the substrate, the gate electrode having a region thereof disposed between a region of the drain electrode and a region of the source electrode; a ground conductor disposed on a lower surface of the substrate; a plurality of electrically conductive vias passing through the substrate, each one of the vias having one end electrically connected to a different region of the ground conductor and having another end electrically connected to the gate electrode. The plurality of electrically conductive vias provide parallel and symmetric connections between the gate electrode and the ground conductor.
Claims9
A field effect transistor structure comprising:
- a single crystal substrate having:
- a source, gate and drain electrodes disposed on an upper surface of the substrate, the gate electrode having a region thereof disposed between a region of the drain electrode and a region of the source electrode;
- a ground conductor disposed on a lower surface of the substrate;
- a plurality of electrically conductive vias passing through the substrate, each one of the vias having one end electrically connected to a different region of the ground conductor and having another end electrically connected to the gate electrode.
Dependencies are inferred from the claim text.