Thin film transistor array panel and manufacturing method thereof

A method of manufacturing a thin film transistor array panel, the method comprising:

• forming a gate line and a storage electrode line;
• forming a gate insulating layer covering the gate line and the storage electrode line;
• forming a first semiconductor and a second semiconductor overlapping the storage electrode line on the gate insulating layer;
• forming a data line having a source electrode and a drain electrode on the first semiconductor;
• forming a passivation layer having a contact hole exposing the drain electrode and an opening exposing the second semiconductor;
• removing the second semiconductor exposed through the opening;
• and
• forming a pixel electrode connected to the drain electrode through the contact hole,
• wherein the first and second semiconductors, and the data line and the drain electrode are formed by photolithography using one photoresist film as an etch mask.