Method and system for making a nano-plate for imprint lithography
AssigneeASML Holding N.V.
InventorHarry Sewell
Life of this patent
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Abstract
Provided is a method and system for manufacturing a nano-plate. The method includes depositing two or more types of film around a central core to form a plurality of film layers, each film layer being of a different type than its adjacent layers. Next, the deposited film layers are sectioned to expose a patterned surface. Finally, the patterned surface is then planarized and selectively etched to form a relief pattern which can be used as an imprint stamp.
Claims12
A method for manufacturing a nano-plate imprint mask, the nano-plate imprint mask being used to make lithographic patterns, comprising:
- depositing two or more types of film around a central core to form a plurality of film layers, each film layer being of a different type than its adjacent layers;
- sectioning the deposited film layers to expose a patterned surface;
- planarizing the patterned surface;
- and
- selectively etching patterns comprised of one of the types of film to a predetermined depth to produce a selectively etched surface.
An apparatus for manufacturing a nano-plate imprint mask, the nano-plate imprint mask being used to make lithographic patterns, comprising:
- means for depositing two or more types of film around a central core to form a plurality of film layers, each film layer being of a different type than its adjacent layers;
- means for sectioning the deposited film layers to expose a patterned surface;
- means for planarizing the patterned surface;
- and
- means for selectively etching patterns comprised of one of the types of film to a predetermined depth to produce a selectively etched surface.
Dependencies are inferred from the claim text.