Non-contact discrete removal of substrate surface contaminants/coatings, and method, apparatus, and system for implementing the same

A substrate preparation apparatus, the apparatus comprising:

• an energy source capable of emitting energy onto a substrate to be prepared, the energy being emitted in a femtosecond pulse duration, the substrate having a first layer and a second layer, the first layer configured to be removed from over the second layer, the energy configured to have an energy frequency capable of being absorbed by the second layer while transparently penetrating through the first layer;
• and
• a support component configured to support the substrate to be prepared as energy is emitted onto the first layer of the substrate,
• wherein absorption of the energy by the second layer generates an energy wave capable of breaking a bond between the first layer and the second layer at a location of application of the energy so as to remove a portion of the first layer at the location of the application of the energy.