Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel
AssigneeSamsung Electronics Co., Ltd.
InventorsHi-Kuk Lee, Yako Yuko, Dong-Ki Lee, Kyu-Young Kim
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Abstract
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl group including one to five carbon atoms, an ethyl 3-ethoxy propionate, an alkyl acetate that includes an alkyl group including three to eight carbon atoms, and an alkyl lactate that includes an alkyl group including one to six carbon atoms. The composition may be used to make high-quality display panels with uniformly-coated insulating layers.
Claims24
A photosensitive resin composition comprising:
- an alkali-soluble resin;
- a quinone diazide;
- a surfactant;
- and
- a solvent that includes
- a diethylene glycol dialkyl ether that includes an alkyl group having one to five carbon atoms,
- an ethyl 3-ethoxy prop ionate,
- an alkyl acetate that includes an alkyl group having three to eight carbon atoms, and
- an alkyl lactate that includes an alkyl group having one to six carbon atoms.
A thin film panel comprising:
- a substrate;
- a thin film pattern formed on the substrate;
- and
- an insulating layer formed on the thin film pattern and made from a photosensitive resin composition including an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent that comprises:
- a diethylene glycol dialkyl ether that includes an alkyl group having one to five carbon atoms,
- an ethyl 3-ethoxy propionate,
- an alkyl acetate that includes an alkyl group having three to eight carbon atoms, and
- an alkyl lactate that includes an alkyl group having one to six carbon atoms.
A method of manufacturing a thin film panel, the method comprising:
- forming a thin film pattern on a substrate;
- coating a photosensitive resin composition including an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent;
- performing a light exposure on the photosensitive resin composition through a photomask;
- and
- developing the photosensitive resin composition to obtain a thin film pattern,
- wherein the solvent comprises:
- a diethylene glycol dialkyl ether that includes an alkyl group having one to five carbon atoms,
- an ethyl 3-ethoxy propionate,
- an alkyl acetate that includes an alkyl group having three to eight carbon atoms, and
- an alkyl lactate that includes an alkyl group having one to six carbon atoms.
Dependencies are inferred from the claim text.