US 2006/0130971 A1 · Apparatus for generating plasma by RF power

Abstract

A method and apparatus for processing a substrate is provided. In one aspect, the chamber comprises a chamber body and a support assembly at least partially disposed within the chamber body adapted to support a substrate thereon. The chamber further comprises a lid assembly disposed on an upper surface of the chamber body. The lid assembly includes a top plate and a gas delivery assembly which define a plasma cavity therebetween, wherein the gas delivery assembly is adapted to heat the substrate. A remote plasma source having a U-shaped plasma region is connected to the gas delivery assembly.

Claims20

Dependent claims

A processing chamber for a substrate, comprising:

a chamber body defining a processing region;
a support assembly at least partially disposed within the chamber body and adapted to support a substrate within the processing region;
and
a plasma source having a cylindrical electrode and a ground electrode defining a plasma region in communication with the processing region.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

11/137,200Filed 24 May 2005

Priority

21 Dec 2004

Published

22 Jun 2006

Term ends

Not estimatedThe source records don’t support an estimate.

Classification10 codes

H10P 50/283
Of inorganic materials: by chemical means
H01J 37/32082
Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources: radio frequency generated…
H01J 37/32357
Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources: generation remote from the…
H01J 37/32541
Electrodes: shape

Apparatus for generating plasma by RF power

Life of this patent

Apparatus for generating plasma by RF power

Life of this patent

Abstract

Claims20