Substrate treating apparatus and method
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorShuzo Nagami
Life of this patent
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Abstract
A mixer produces a treating solution by mixing chloride into hot deionized water heated by a hot water unit. The treating solution produced is supplied to a treating tank through a treating solution pipe and a common pipe. In the treating tank, substrates held by a lifter are immersed in the treating solution. Subsequently, the lifter is raised to pull the substrates up from the treating solution. Since the droplets adhering to the substrates are acid, an oxidation reaction of the substrates is inhibited. That is, when the substrates dry, an oxide does not deposit on the substrates, thereby preventing formation of watermarks.
Claims20
A substrate treating apparatus comprising:
- a treating tank for treating substrates;
- treating solution supply device for supplying said treating tank with a treating solution having hydrogen ions added to hot deionized water;
- and
- holding device vertically movable, while holding the substrates, between a treating position in said treating tank and a standby position above said treating tank;
- wherein said treating solution is stored in said treating tank, and said holding device is raised from said treating position to said standby position to perform drying treatment of the substrates.
A substrate treating method comprising:
- a step of immersing substrates in a treating solution having hydrogen ions added to hot deionized water;
- and
- a step of performing drying treatment of the substrates by pulling the substrates up from the treating solution.
Dependencies are inferred from the claim text.