Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
AssigneeApplied Materials, Inc., a Delaware corporation
InventorsQiwei Liang, Siqing Lu
Life of this patent
Estimating the term…
Abstract
A gas distributor for use in a semiconductor processing chamber is provided. The gas distributor comprises a gas inlet, a gas outlet, and a stem section having a spiral thread. The gas distributor further comprises a body having a gas deflecting surface that extends radially outward away from the stem section and a lower face disposed on the opposite side of the body from the gas deflecting surface, a lateral seat disposed between the spiral thread and the gas deflecting surface, and a gas passageway that extends from the gas inlet through the stem section and body to the gas outlet. In a specific embodiment, the lateral seat is adapted to hold a sealing member.
Claims20
A gas distributor for use in a semiconductor processing chamber, the gas distributor comprising:
- a gas inlet;
- a gas outlet;
- a stem section having a spiral thread;
- a body having a gas deflecting surface that extends radially outward away from the stem section and a lower face disposed on the opposite side of the body from the gas deflecting surface;
- a lateral seat disposed between the spiral thread and the gas deflecting surface;
- and
- a gas passageway that extends from the gas inlet through the stem section and body to the gas outlet.
A substrate processing system, the system comprising:
- a processing chamber having an interior upper surface that includes a centered circular opening;
- a substrate support member disposed in the processing chamber;
- a gas distributor that extends through the circular opening in the upper surface of the chamber towards the substrate support member, the gas distributor comprising a gas inlet, a gas outlet, a stem section having a spiral thread, a body having a gas deflecting surface that extends radially outward away from the stem section and a lower face disposed on the opposite side of the body from the gas deflecting surface, a lateral seat disposed between the spiral thread and the gas deflecting surface, and a gas passageway that extends from the gas inlet through the stem section and body to the gas outlet;
- and
- a gas exit circumscribing the gas distributor.
A gas nozzle for use in a semiconductor processing chamber, the nozzle comprising:
- a proximal portion and a distal portion, the proximal portion connected to a chamber wall of the semiconductor processing chamber, the distal portion oriented inwardly away from the chamber wall into an interior of the semiconductor processing chamber;
- a proximal end configured to be coupled with a gas supply;
- a stem section adjacent to the proximal end;
- a spiral thread section adjacent to the stem section;
- a distal end comprising a nozzle opening;
- a nozzle body extending a first distance from the distal end;
- a gas passage extending from the proximal end to the distal end;
- and
- a lateral seat disposed between the spiral thread section and the nozzle body.
Dependencies are inferred from the claim text.