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US 2006/0125913 A1Published application
Writing of photo-induced structures
OwnerMark Sceats, Dmitri Stepanovinventors
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Abstract
A method of writing a photo-induced structure into a photosensitive material substrate, the method comprising the steps of creating an interference pattern utilising at least two light beams, exposing the substrate to the interference pattern for photo-inducing material changes in the substrate, and creating an irregularity in the interference pattern by controlling a wavefront of at least one of the beams, for creating a functional defect in the photo-induced structure.
Claims1
A method of writing a photo-induced structure into a photosensitive material substrate, the method comprising:
- creating an interference pattern utilising at least two light beams,
- exposing the substrate to the interference pattern for photo-inducing material changes in the substrate, and
- creating an irregularity in the interference pattern by controlling a wavefront of at least one of the beams, for creating a functional defect in the photo-induced structure.
Dependencies are inferred from the claim text.