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AssigneeKabushiki Kaisha Toshiba
InventorsHajime Tanaka, Takeo Ito, Tomoko Nakazawa, Masaaki Inamura, Masayuki Yoshii
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A metal back-attached phosphor screen comprises at least a phosphor layer (3) and a metal back layer (5) on an inner surface of a face plate (1), a first treatment layer (4) containing at lest one kind of inorganic oxide such as SiO2,a silicon oxide containing an alkali metal such as Na, Al2O3, TiO2, or ZrO2 formed on the phosphor layer (3), and the metal back layer (5) formed thereon. A second treatment layer containing the aforementioned inorganic oxide can be formed on the metal back layer (5). A metal back-attached phosphor screen, when used in an image display device such as a FED, can not only inhibit the occurrence of abnormal discharge and improve withstand voltage characteristics but also can increase brightness.
A metal back-attached phosphor screen, comprising a phosphor layer and a metal back layer on an inner surface of a face plate, wherein a first treatment layer containing an oxide of one kind or two or more kinds of elements selected from the group consisting of silicon, aluminum, titanium, and zirconium is formed on the phosphor layer and the metal back layer is formed on the first treatment layer.
A metal back-attached phosphor screen, comprising a phosphor layer and a metal back layer on an inner surface of a face plate, wherein a first treatment layer containing one kind or two or more kinds of inorganic oxides selected from the group consisting of silicon oxide, a silicon oxide containing one kind or two or more kinds of alkali metal elements, aluminum oxide, titanium oxide, and zirconium oxide is formed on the phosphor layer and the metal back layer is formed on the first treatment layer.
A method of forming a metal back-attached phosphor screen, comprising:
A method of forming a metal back-attached phosphor screen, comprising:
Dependencies are inferred from the claim text.