CMOS image sensor and method for fabricating the same
OwnerMeng Junginventor
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Abstract
A CMOS image sensor and a method for fabricating the same are disclosed, in which an incidence of void formation is reduced or prevented, to improve characteristics of the image sensor. The CMOS image sensor includes a plurality of photodiode areas in a semiconductor substrate at constant intervals, a dielectric layer on or over the semiconductor substrate and the photodiode areas, a color filter layer on or over the dielectric layer at constant intervals, a void prevention layer between adjacent color filters in the color filter layer, a planarization layer on or over the semiconductor substrate and the void prevention layer, and a plurality of microlenses on the planarization layer.
Claims20
A CMOS image sensor comprising:
- a plurality of photodiode areas in a semiconductor substrate at substantially constant intervals;
- a dielectric layer on or over an entire active area surface of the semiconductor substrate including the photodiode areas;
- a color filter layer comprising a plurality of color filters on or over the dielectric layer at substantially constant intervals;
- a void prevention layer between adjacent color filters and (optionally) on a peripheral part of the color filters;
- a planarization layer on or over the entire surface of the semiconductor substrate active area, including the void prevention layer;
- and
- a plurality of microlenses on the planarization layer, corresponding to the plurality of color filters.
A method for fabricating a CMOS image sensor comprising:
- forming a dielectric layer on a semiconductor substrate comprising a plurality of photodiode areas;
- forming a plurality of color filters on the dielectric layer at substantially constant intervals;
- forming a void prevention layer between adjacent color filters and (optionally) on peripheral portions of the color filters;
- forming a planarization layer on or over an entire active area surface of the semiconductor substrate, including the void prevention layer;
- and
- forming a plurality of microlenses on or over the planarization layer corresponding to the plurality of color filters.
Dependencies are inferred from the claim text.