Method for controlling a vaporizer of ion implantation equipment during indium implantation process
AssigneeDongbuAnam Semiconductor Inc.
InventorSang Kim
Life of this patent
Estimating the term…
Abstract
Disclosed is a method for controlling a vaporizer in ion implantation equipment during indium implantation process. The method comprises the steps of: (a) injecting a solid indium trichloride in a vaporizer; (b) raising a vaporizer temperature up to a first temperature at which water is able to be vaporized; (c) conditioning the vaporizer temperature in a temperature range between the first temperature and a second temperature at which the solid indium trichloride is able to be hydrolyzed, until water contained in the solid indium chloride can be removed; and (d) raising the vaporizer temperature up to a third temperature at which the indium trichloride is able to be vaporized.
Claims15
A method for controlling a vaporizer in ion implantation equipment during an indium implantation process, comprising the steps of:
- injecting solid indium trichloride into a vaporizer;
- raising a vaporizer temperature to a first temperature at which water is able to be vaporized;
- conditioning the vaporizer temperature in a temperature range between the first temperature and a second temperature at which water contained in the solid indium chloride is removed;
- and
- raising the vaporizer temperature up to a third temperature at which the indium trichloride is able to be vaporized.
A method for removing water from a hydrated solid indium source material, comprising the steps of:
- raising a temperature of a vaporizer in an ion implantation apparatus to a water vaporization temperature;
- raising the vaporizer temperature to a water removal temperature at which water in the solid indium source material can be removed;
- and
- raising the vaporizer temperature up to an indium source material vaporization temperature.
An apparatus for implanting indium ions, comprising:
- a vaporizer adapted to heat a hydrated solid indium source material;
- and
- a temperature controller adapted to raise the vaporizer temperature to a water vaporization temperature, a water removal temperature at which water in the solid indium source material can be removed, and an indium source material vaporization temperature at which the indium source material can be vaporized.
Dependencies are inferred from the claim text.