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AssigneePlanar Solutions, LLC
InventorsGert Moyaerts, Ken Delbridge, Nichole Koontz, Saeed Mohseni, Gerome Sayles, Deepak Mahulikar
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A composition for chemical mechanical polishing a surface of a substrate having a plurality of ultra high purity sol gel processed colloidal silica particles for chemical mechanical polishing having alkali metals Li, Na, K, Rb, Cs, Fr and a combination thereof, at a total alkali concentration of about 300 ppb or less, with the proviso that the concentration of Na, if present, is less than 200 ppb; and a medium for suspending the particles is provided. Also, provided are methods of chemical mechanical polishing which included a step of contacting a substrate and a composition according to the present invention. The contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
A composition for chemical mechanical polishing a surface of a substrate comprising:
The composition of claim 17, further comprising a surfactant selected from the group consisting of:
The composition of claim 18, wherein said surfactant is an alkoxylated non-ionic surfactant.
A method of chemical mechanical polishing a substrate, comprising the step of:
Dependencies are inferred from the claim text.