Method and apparatus for cathodic arc deposition of materials on a substrate
AssigneeUnited Technologies Corporation
InventorsRussell Beers, Asumini Kasule, Kevin Collins
Life of this patent
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Abstract
A method for applying a coating by a cathodic is provided. The method includes the steps of: a) providing a cathodic arc coater that includes a power source and utilizes a disk-shaped cathode, the cathode having an evaporative surface extending between a first end surface and a second end surface, wherein the evaporative surface has an area; b) determining a maximum acceptable power density for the evaporative surface; and c) applying a magnitude of electrical current from the power source to the cathode, wherein the electrical current magnitude divided by the area is equal to or less than the maximum acceptable power density for the evaporative surface.
Claims6
A method for applying a coating by cathodic arc coater, comprising the steps of:
- providing a cathodic arc coater that includes a power source and utilizes a disk-shaped cathode, the cathode having an evaporative surface extending axially between a first end surface and a second end surface, and the evaporative surface having an area;
- determining a maximum acceptable power density for the evaporative surface;
- applying a magnitude of electrical current from the power source to the cathode, wherein the electrical current magnitude divided by the area is equal to or less than the maximum acceptable power density for the evaporative surface.
A method for applying a coating by cathodic arc coater, comprising the steps of:
- providing a cathodic arc coater that includes a power source and utilizes a disk-shaped cathode, the cathode having a diameter, and an evaporative surface extending between a first end surface and a second end surface,
- determining a maximum acceptable heat transfer flux value for the evaporative surface;
- applying an electrical current from the power source to the cathode, the electrical current having a magnitude that operable to create a heat transfer flux for the evaporative surface that is equal to or less than the maximum acceptable heat transfer flux value for the evaporative surface.
Dependencies are inferred from the claim text.