Back to results
US 2006/0124243 A1Published application
Disturbance-free, recipe-controlled plasma processing system and method
AssigneeHitachi, Ltd.
InventorsAkira Kagoshima, Hideyuki Yamamoto, Shoji Ikuhara, Toshio Masuda, Hiroyuki Kitsunai, Junichi Tanaka, Natsuyo Morioka, Kenji Tamaki
Life of this patent
Estimating the term…
Abstract
A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.
Claims3
A plasma processing system comprising:
- first means for plasma-processing a sample based on a recipe for plasma processing;
- and
- second means for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in said first means;
- and
- wherein a next sample is plasma processed in said first means based on the modified recipe.
2 more elements
A plasma processing system comprising:
- first means for plasma-processing a sample based on a recipe for plasma processing;
- second means for modifying the recipe in accordance with a difference between a measured value of a processed sample and a predetermined target value for the sample;
- and
- third means for selecting one recipe from a plurality of recipes based on the modified recipe;
- wherein a next sample is plasma processed in said first means based on the selected recipe.
2 more elements
A plasma processing system comprising:
- first means for plasma-processing a sample based on a recipe for plasma processing
- an in-situ sensor for monitoring a condition of the plasma processing and providing monitored information;
- second means for determining an optimum recipe in accordance with the monitored information from said in-situ sensor;
- and
- third means for selecting one recipe from a plurality of recipes based on a determined optimum recipe;
- wherein a next sample is plasma processed based on the selected recipe.
3 more elements
Dependencies are inferred from the claim text.