Composition for etching double metal layer, method of fabricating array substrate using the composition, and method of forming double metal line using the composition

A method of fabricating an array substrate for a liquid crystal display device, comprising:

• forming a first double metal layer including aluminum neodymium (AlNd) and molybdenum (Mo) on a substrate;
• forming a first photoresist pattern on the first double metal layer;
• etching the first double metal layer with a composition including about 63.5% to about 64.5% by weight of a phosphoric acid, about 8% to about 9% by weight of a nitric acid, about 8% to about 12% by weight of an acetic acid, and an anionic additive to form a gate line and a gate electrode;
• forming a gate insulating layer on the gate line and the gate electrode;
• forming a semiconductor layer on the gate insulating layer at a portion corresponding to the gate electrode;
• forming a data line on the gate insulating layer and source/drain electrodes on the semiconductor layer;
• forming a passivation layer on the data line and the source and drain electrodes, the passivation layer has a drain contact hole exposing the drain electrode;
• and
• forming a pixel electrode on the passivation layer, the pixel electrode connected to the drain electrode through the drain contact hole.

A method of forming a double metal line, comprising:

• forming a double metal layer including aluminum neodymium (AlNd) and molybdenum (Mo) on an insulating layer;
• forming a photoresist pattern on the double metal layer;
• and
• etching the double metal layer with a composition including about 63.5% to about 64.5% by weight of a phosphoric acid, about 8% to about 9% by weight of a nitric acid, about 8% to about 12% by weight of an acetic acid, and an anionic additive.