Method for performing full-chip manufacturing reliability checking and correction

A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate files corresponding to a mask for use in a lithographic imaging process, the generation of the files comprising the steps of:

• (a) obtaining a desired target pattern having a plurality of features to be imaged on a substrate;
• (b) simulating a wafer image utilizing the target pattern and process parameters associated with a defined process;
• (c) defining at least one feature category;
• (d) identifying features in said target pattern having said plurality of features that correspond to said at least one feature category, and recording an error value for each feature identified as corresponding to said at least one feature category;
• and
• (e) generating a statistical summary which indicates the error value for each feature identified as corresponding to said at least one feature category.

A device manufacturing method comprising the steps of:

• (a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
• (b) providing a projection beam of radiation using an imaging system;
• (c) using a pattern on a mask to endow the projection beam with a pattern in its cross-section;
• (d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material,
• wherein, in step (c), said mask is formed by a method comprising the steps of:
• obtaining a desired target pattern having a plurality of features to be imaged on a substrate;
• simulating a wafer image utilizing the target pattern and process parameters associated with a defined process;
• defining at least one feature category;
• identifying features in said target pattern having said plurality of features that correspond to said at least one feature category, and recording an error value for each feature identified as corresponding to said at least one feature category;
• and
• generating a statistical summary which indicates the error value for each feature identified as corresponding to said at least one feature category.