Method for applying metal features onto metallized layers using electrochemical deposition using acid treatment
AssigneeSemitool, Inc.
InventorsRajesh Baskaran, Bioh Kim, Linlin Chen, Lyndon Graham
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AssigneeSemitool, Inc.
InventorsRajesh Baskaran, Bioh Kim, Linlin Chen, Lyndon Graham
Estimating the term…
The present invention is directed to a process for producing structures containing metallized features for use in microelectronic workpieces. The process treats a barrier layer to promote the adhesion between the barrier layer and the metallized feature. Suitable means for promoting adhesion between barrier layers and metallized features according to the invention include an acid treatment of the barrier layer, an electrolytic treatment of the barrier layer, or deposition of a bonding layer between the barrier layer and metallized feature. The present invention thus modifies an exterior surface of a barrier layer making it more suitable for electrodeposition of metal on a barrier, thus eliminating the need for a PVD or CVD seed layer deposition process.
A method for forming a metallized feature on a surface of a microelectronic workpiece comprising:
A process for applying a metal structure to a workpiece comprising:
A method for forming a copper feature on a surface of a microelectronic workpiece comprising:
Dependencies are inferred from the claim text.