System and method for reticle protection and transport

A method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool, comprising:

• (a) loading the substrate into a removable substrate transport cassette to produce a cassette-substrate arrangement, wherein said removable substrate transport cassette has at least one vent and at least one filter;
• (b) loading said cassette-substrate arrangement into a box to produce a box-cassette-substrate arrangement, said box comprised of a base and a lid;
• (c) transporting said box-cassette-substrate arrangement to a shelf of a first storage rack;
• (d) transporting said box-cassette-substrate arrangement out of vacuum from said first storage rack to an entry-exit module;
• (e) unlatching a lid of said box from a base of said box;
• (f) lowering said base on an elevator, said base supporting said cassette-substrate arrangement;
• (g) engaging said cassette-substrate arrangement with a shuttle;
• (h) using said shuttle to transport said cassette-substrate arrangement into a loadlock;
• and
• (i) transitioning said loadlock from atmospheric pressure to vacuum, wherein during transitioning, said at least one vent and said at least one filter restrict particles within said loadlock from entering said cassette-substrate arrangement and reaching a surface of the substrate.