Catadioptric projection objective with geometric beam splitting
AssigneeCarl Zeiss SMT GmbH
InventorsDavid Shafer, Alexander Epple, Aurelian Dodoc, Helmut Beierl, Wilhelm Ulrich
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Abstract
A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
Claims52
A projection exposure machine for microlithography, comprising:
- a catadioptric projection objective for projecting a mask pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image;
- a device for moving a mask bearing the mask pattern perpendicular to an optical axis of the projection objective;
- a device for moving a substrate arranged in a region of the image plane perpendicular to the optical axis of the projection objective;
- wherein the projection objective has at least one catadioptric objective part that comprises a concave mirror;
- wherein the projection objective has a first folding mirror;
- wherein a sum S of a number Z of the intermediate images, a number F of the folding mirrors and a number K of the concave mirrors of the projection objective is an odd whole number, and
- wherein a control device for driving the device for moving the mask and for driving the device for moving the substrate is configured in such a way that the mask and the substrate are moved synchronously in the same, parallel directions.
A catadioptric projection objective for projecting a mask pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image, comprising:
- at least one catadioptric objective part comprising a concave mirror;
- and
- a first folding mirror;
- wherein a sum S of a number Z of the intermediate images, a number F of the folding mirrors and a number K of the concave mirrors of the projection objective is an odd whole number;
- and
- wherein the projection objective is adapted for use with a projection exposure machine having a control device for driving a device for moving the mask and for driving a device for moving the substrate arranged in a region of the image plane of the projection objective and wherein the control device is configured such that the mask and the substrate move synchronously in the same, parallel directions.
A projection exposure machine for microlithography, comprising:
- a catadioptric projection objective for projecting a mask pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image;
- a device for moving a mask bearing the mask pattern perpendicular to an optical axis of the projection objective;
- a device for moving a substrate arranged in a region of the image plane perpendicular to the optical axis of the projection objective;
- wherein the projection objective has at least one catadioptric objective part that comprises a concave mirror;
- wherein a sum S of a number of the intermediate images and a number of mirrors of the projection objective including the at least one concave mirror is an odd whole number, and
- wherein a control device for driving the device for moving the mask and for driving the device for moving the substrate is configured in such a way that the mask and the substrate are moved synchronously in the same, parallel directions.
A catadioptric projection objective for projecting a mask pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image, comprising:
- at least one catadioptric objective part comprising a concave mirror;
- wherein a sum S of a number of the intermediate images and a number of mirrors of the projection objective including the at least one concave mirror is an odd whole number;
- and
- wherein the projection objective is adapted for use with a projection exposure machine having a control device for driving a device for moving the mask and for driving a device for moving the substrate arranged in a region of the image plane of the projection objective and wherein the control device is configured such that the mask and the substrate move synchronously in the same, parallel directions.
Dependencies are inferred from the claim text.