Solid-state imaging device and solid-state imaging device manufacturing method
AssigneePanasonic Corporation
InventorKenji Yokozawa
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AssigneePanasonic Corporation
InventorKenji Yokozawa
Estimating the term…
An object of the present invention is to provide a solid-state imaging device which can improve color mixture from adjacent color filter layers, nonuniform tone of lines and sensitivity variations. A solid-state imaging device 1 includes: a semiconductor substrate 11 on which pixels are placed like a matrix; and each of the pixels having a photoelectric conversion element 13 and a color filter layer 21 which is formed on the photoelectric conversion element 13. The solid-state imaging device 1 includes resin parts 20 which are formed at the boundaries of these photoelectric conversion devices 13 which are adjacent to each other, each of the resin parts 20 having an upward convex shape. Each color filter layer 21 of the device is formed so that the color filter layer covers the area ranging from the summit of a resin part to the summit of an adjacent resin part, and each color filter layer 21 is thinner in the peripheral part than in the center part around the summit.
A solid-state imaging device in which pixels are arrayed like a matrix above a semiconductor substrate, each pixel having a photoelectric conversion element and a color filter layer which is formed above the photoelectric conversion element, and said device comprising
The solid-state imaging device according to claim 2,
A manufacturing method of a solid-state imaging device in which pixels are arrayed like a matrix above a semiconductor substrate, each pixel having a photoelectric conversion element and a color filter layer which is formed above the photoelectric conversion element, and said method comprising:
Dependencies are inferred from the claim text.