US 2006/0076513 A1 · Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method

Abstract

A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles is provided which is capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. The apparatus comprises: a first slit member (10) in which a plurality of rectangular apertures (11, 12) are respectively arranged by different angles; a second slit member (20) in which a plurality of rectangular apertures (21, 22) which are respectively positioned in parallel with the corresponding rectangular apertures of the first slit member, are arranged; and a deflecting unit (40) for deflecting an electron beam, which has been transmitted through a plurality of apertures of the first slit member, so that, when the electron beam transmitted through the first aperture of the first slit member is transmitted through the corresponding first aperture of the second slit member, the electron beam transmitted through the apertures except for the first aperture of the first slit can be intercepted by the second slit member.

Claims14

Dependent claims

A variable rectangle-type electron beam exposing apparatus for forming rectangular beams of different angle, comprising:

a first slit member in which a plurality of rectangular apertures are respectively arranged by different angles;
a second slit member in which a plurality of rectangular apertures, which are respectively positioned in parallel with the corresponding rectangular apertures of the first slit member, are arranged;
and
a deflecting unit for deflecting an electron beam, which has been transmitted through a plurality of apertures of the first slit member, so that, when the electron beam transmitted through the first aperture of the first slit member passes through the corresponding first aperture of the second slit member, the electron beam transmitted through the other apertures than the first aperture of the first slit member can be intercepted by the second slit member, and, when the electron beam transmitted through the second aperture of the first slit passes through the corresponding second aperture of the second slit member, the electron beam transmitted through the other apertures than the second aperture of the first slit member can be intercepted by the second slit member.

1 more element

A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angle comprising:

a first slit member having a pentagonal aperture in which two angles adjoining each other and one angle not adjoining these two angles are respectively formed into a right angle;
a second slit member having a pentagonal aperture in which two angles adjoining each other and one angle not adjoining these two angles are respectively formed into a right angle, and a position of the right angle not adjoining the two right angles which adjoin each other is located at a position reverse to the position of the right angle not adjoining the two right angles of the first slit member by the angle 180°;
and
a deflecting member for deflecting an electron beam transmitted through the pentagonal aperture of the first slit so that the electron beam transmitted through the pentagonal aperture of the first slit can be partially transmitted through the pentagonal aperture of the second slit member and the other portions of the electron beam can be intercepted.

1 more element

Dependencies are inferred from the claim text.

Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method

Life of this patent

Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method

Life of this patent

Abstract

Claims14