Mask inspection apparatus, mask inspection method, and electron beam exposure system

Abstract

A mask inspection apparatus includes: an electron gun for generating an electron beam; an exposure mask for shaping the electron beam into a predetermined cross-sectional shape; means for scanning the electron beam shaped by the exposure mask; means for selecting and transmitting part of the shaped electron beam, which selecting means includes a thin film having a small transmission aperture transmitting the electron beam scanned by the scanning means and includes a thick substrate having an opening larger than the small transmission aperture and a thickness greater than that of the thin film; and means for detecting the electron beam passed through the selecting means and outputting a current signal. The detecting means includes: a reflective body for reflecting the electron beam selected by the selecting means; and a detector for detecting the electron beam reflected by the reflective body.

Dependencies are inferred from the claim text.