Substrate processing apparatus and substrate processing method

A substrate processing method using a substrate processing apparatus, comprising:

• a processing chamber;
• a susceptor on which a substrate to be processed is to be placed;
• and
• a heating unit disposed below said susceptor for heating said substrate to be processed placed on said susceptor, wherein
• said susceptor and said heating unit are accommodated in said processing chamber,
• in a state in which said susceptor and said heating unit are relatively rotated, said substrate to be processed is processed,
• at least said susceptor is lifted and lowered in said processing chamber, and
• a substrate to be processed lifting and lowering apparatus for lifting and lowering said substrate to be processed with respect to at least a portion of said susceptor is disposed in said processing chamber, comprising the steps of:
• transferring said substrate to be processed from said susceptor to said substrate to be processed lifting and lowering apparatus when said susceptor is lowered, and
• processing said substrate to be processed when said susceptor is lifted in a state in which said substrate to be processed is placed by said susceptor.