Exhaust gas scrubber for epitaxial wafer manufacturing device
AssigneeSumco Corporation
InventorYasuhiro Rikihisa
Life of this patent
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Abstract
This exhaust gas scrubber for an epitaxial wafer manufacturing device includes: a scrubber inlet tube for introducing an exhaust gas discharged from an epitaxial wafer manufacturing device; and a wash tube unit formed inside the scrubber inlet tube for spraying wash water toward an interior of the scrubber inlet tube from one end thereof so as to wash adhesions inside the scrubber inlet tube, wherein the wash tube unit includes an outer tube through which inert gas constantly flows, a middle tube which is formed inside the outer tube and through which inert gas intermittently flows, and an inner tube which is formed inside the middle tube and through which the wash water and inert gas alternately flow.
Claims4
An exhaust gas scrubber for an epitaxial wafer manufacturing device, comprising:
- a scrubber inlet tube for introducing an exhaust gas discharged from an epitaxial wafer manufacturing device;
- and a wash tube unit formed inside said scrubber inlet tube for spraying wash water toward an interior of said scrubber inlet tube from one end thereof so as to wash adhesions inside said scrubber inlet tube,
- wherein said wash tube unit comprises an outer tube through which inert gas constantly flows, a middle tube which is formed inside said outer tube and through which inert gas intermittently flows, and an inner tube which is formed inside said middle tube and through which said wash water and inert gas alternately flow.
Dependencies are inferred from the claim text.