Thin film circuit device, manufacturing method thereof, electro-optical apparatus, and electronic system

A method of manufacturing a thin film circuit device, comprising:

• forming a first peeling layer over a first substrate;
• forming a first underlayer over the first peeling layer;
• forming a first thin film circuit over the first underlayer;
• forming a first contact hole at the first underlayer by exposing at least the surface of the first peeling layer;
• forming a first wire and a first connection electrode that is formed at a bottom of the first contact hole, the first wire connected between the first thin film circuit and the first connection electrode;
• forming a first protective layer over the first underlayer so as to be covered with the first thin film circuit, the first connection electrode and the first wire;
• forming a second peeling layer over a second substrate;
• forming a second underlayer over the second peeling layer;
• forming a second thin film circuit over the second underlayer;
• forming a second protective layer over the second underlayer so as to be covered with the second thin film circuit;
• forming a second contact hole at the second protective layer;
• forming a second wire and a second connection electrode that is formed over the second protective layer, the second wire connected between the second thin film circuit and the second connection electrode;
• transferring the first thin film circuit from the first substrate to a third substrate, the transferring the first thin film circuit including the first thin film circuit being peeled by using the first peeling layer and the first connection electrode exposes against the third substrate;
• and
• peeling the second thin film circuit from the second substrate so that the second connection electrode bonds the first connection electrode.