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US 2006/0068320 A1Published application
Resist composition and method of pattern formation with the same
AssigneeFuji Photo Film Co., Ltd.
InventorsHyou Takahashi, Kenji Wada
Life of this patent
Estimating the term…
Abstract
A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
Claims20
A resist composition comprising
- (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
Dependencies are inferred from the claim text.