Organometallic precursor compounds
AssigneePraxair Technology, Inc.
InventorScott Meiere
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Abstract
This invention relates to organometallic precursor compounds represented by the formula (H)mM(R)n wherein M is a metal or metalloid, R is the same or different and is a substituted or unsubstituted, saturated or unsaturated, heterocyclic radical containing at least one nitrogen atom, m is from 0 to a value less than the oxidation state of M, n is from 1 to a value equal to the oxidation state of M, and m+n is a value equal to the oxidation state of M, a process for producing the organometallic precursor compounds, and a method for producing a film or coating from the organometallic precursor compounds.
Claims20
An organometallic precursor compound represented by the formula (H)mM(R)n wherein M is a metal or metalloid, R is the same or different and is a substituted or unsubstituted, saturated or unsaturated, heterocyclic radical containing at least one nitrogen atom, m is from 0 to a value less than the oxidation state of M, n is from 1 to a value equal to the oxidation state of M, and m+n is a value equal to the oxidation state of M, provided that R is other than unsubstituted pyrrolidinyl when M is Si and n is 4.
An organometallic precursor compound represented by the formula (H)mM(R)n wherein M is a metal or metalloid, R is the same or different and is selected from (i) a substituted, saturated heterocyclic radical containing at least one nitrogen atom and (ii) a substituted or unsubstituted, unsaturated heterocyclic radical containing at least one nitrogen atom, m is from 0 to a value less than the oxidation state of M, n is from 1 to a value equal to the oxidation state of M, and m+n is a value equal to the oxidation state of M, provided that R is other than unsubstituted pyrrolidinyl when M is Si and n is 4.
A process for the production of an organometallic compound comprising (i) reacting a heterocyclic compound containing at least one nitrogen atom with a base material in the presence of a solvent and under reaction conditions sufficient to produce a first reaction mixture comprising a heteroatom-containing compound, (ii) adding a metal source compound to said first reaction mixture, (iii) reacting said heteroatom-containing compound with said metal source compound under reaction conditions sufficient to produce a second reaction mixture comprising said organometallic compound, and (iv) separating said organometallic compound from said second reaction mixture.
A mixture comprising (i) a first organometallic precursor compound represented by the formula (H)mM(R)n wherein M is a metal or metalloid, R is the same or different and is a substituted or unsubstituted, saturated or unsaturated, heterocyclic radical containing at least one nitrogen atom, m is from 0 to a value less than the oxidation state of M, n is from 1 to a value equal to the oxidation state of M, and m+n is a value equal to the oxidation state of M, provided that R is other than unsubstituted pyrrolidinyl when M is Si and n is 4, and (ii) one or more different organometallic precursor compounds.
Dependencies are inferred from the claim text.