Manufacturing method of thin-film magnetic head and thin-film magnetic head

A manufacturing method of a thin-film magnetic head, comprising the steps of:

• depositing a magnetoresistive effect multi-layered film on a lower electrode layer;
• patterning the deposited magnetoresistive effect multi-layered film to define a track width;
• forming a layer containing at least first insulation layer at both track-width direction sides of the patterned magnetoresistive effect multi-layered film;
• depositing a first additional upper metal layer on the patterned magnetoresistive effect multi-layered film and on said layer containing at least first insulation layer;
• patterning said first additional upper metal layer and said magnetoresistive effect multi-layered film to define a length in a direction perpendicular to the track-width direction so as to obtain a magnetoresistive effect multi-layered structure;
• forming a second insulation layer to surround said first additional upper metal layer and said magnetoresistive effect multi-layered structure;
• removing by etching the second insulation layer on the first additional upper metal layer formed on said magnetoresistive effect multi-layered structure;
• thereafter, forming a second additional upper metal layer on said first additional upper metal layer and on said second insulation layer;
• and
• forming an upper electrode layer on said second additional upper metal layer.