Fabrication of 3d photopolymeric devices
OwnerK. Haraldsson, J Hutchison +2inventors
InventorsK. Haraldsson, J Hutchison, Christopher Bowman, Kristi Anseth
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Abstract
A process and apparatus for making polymeric layers. A layer of liquid (20) including a photopolymerizable precursor is formed between a substrate (17) and a photomask (12). A reaction chamber is formed by a base (15), side walls (16) and photomask (12) polymerizes one or more regions of the liquid layer (20) to form a polymeric layer.
Claims25
A method for making a polymeric layer on a substrate comprising the steps of:
- a) forming a layer of a liquid comprising a photopolymerizable polymer precursor between the substrate and an at least partially transparent element;
- b) exposing the liquid layer to light through the at least partially transparent element, thereby polymerizing one or more regions of the liquid layer to form a polymeric layer;
- and
- c) removing any unpolymerized region or regions of the liquid layer.
A method for forming a composite polymeric layer on a substrate comprising the steps of:
- a) forming a first layer of a first liquid comprising a first polymer precursor between the substrate and a first at least partially transparent element, wherein the first at least partially transparent element is a photomask;
- b) exposing the first liquid layer to light through the first at least partially transparent element, thereby polymerizing at least a region of the first liquid layer to form a patterned first polymeric layer having at least one unpolymerized region;
- c) removing any unpolymerized region or regions of the first liquid layer, thereby forming at least one cavity;
- d) removing the first at least partially transparent element;
- e) filling at least one cavity of the first polymeric layer with a second liquid comprising a second polymer precursor, wherein the second polymer precursor is different from the first;
- f) placing a second at least partially transparent element in contact with the second liquid and opposite to the substrate;
- g) exposing the second liquid layer to light through the second at least partially transparent element, thereby polymerizing at least a region of the second liquid layer to form a patterned second polymeric layer;
- and
- h) removing any unpolymerized region or regions of the second liquid layer.
A method for forming a multilayered polymeric device on a substrate comprising the steps of:
- a) forming a first layer of a first liquid comprising a first polymer precursor between the substrate and a first at least partially transparent element;
- b) exposing the first liquid layer to light through the first at least partially transparent element, thereby polymerizing at least a region of the first liquid layer to form a first polymeric layer c) removing any unpolymerized region or regions of the first liquid layer;
- d) removing the first at least partially transparent element;
- e) forming a second layer of a second liquid comprising a second polymer precursor at least in part between the first polymeric layer and a second at least partially transparent element;
- f) exposing the second liquid layer to light through the second at least partially transparent element, thereby polymerizing at least a region of the second liquid layer to form a second polymeric layer;
- and
- g) removing any unpolymerized region or regions of the second liquid layer.
An apparatus for photolithographic fabrication of a photo-polymerized layer from a layer of a liquid comprising a photopolymerizable polymer precursor, the apparatus comprising:
- a) a source of light;
- and
- b) a reaction chamber for containing the liquid layer, the chamber comprising a first and a second enclosing element, the first enclosing element comprising an at least partially transparent element placed in the path of the light and contacting the liquid within the chamber, the second enclosing element of the chamber being opposite to the first enclosing element.
Dependencies are inferred from the claim text.