Pattern formed structure, method of forming pattern, device, electrooptical device and electronic equipment
AssigneeSeiko Epson Corporation
InventorsToshimitsu Hirai, Toshihiro Ushiyama
Life of this patent
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Abstract
A partition-wall structure having a concave portion corresponding to a pattern formed by a functional liquid, including: a first concave portion provided corresponding to a first pattern; a second concave portion provided corresponding to a second pattern that is coupled to the first pattern and whose width is smaller than a width of the first pattern; and a convex portion provided in the first pattern.
Claims11
A partition-wall structure having a concave portion corresponding to a pattern formed by a functional liquid, comprising:
- a first concave portion provided corresponding to a first pattern;
- a second concave portion provided corresponding to a second pattern that is coupled to the first pattern and whose width is smaller than a width of the first pattern;
- and
- a convex portion provided in the first concave portion.
A method of manufacturing a partition-wall structure having concave portions corresponding to a plurality of patterns on a substrate, comprising:
- applying a partition-wall material on the substrate;
- forming a partition wall having a first concave portion corresponding to a first pattern and a second concave portion corresponding to a second pattern that is coupled to the first pattern and whose width is smaller than a width of the first pattern;
- and
- forming a convex portion in the first concave portion.
Dependencies are inferred from the claim text.