Method and system for controlling a velocity field of a supercritical fluid in a processing system
AssigneeTokyo Electron Limited
InventorDarko Babic
Life of this patent
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Abstract
A method and system for controlling a velocity field in a processing system is described. In an exemplary embodiment described, the system includes a multi-outlet exhaust manifold having three or more outlets coupled to the processing system adjacent a surface of a substrate to be process. The three or more outlets are located adjacent the substrate in order to provide for a uniform flow of fluid above the surface of the substrate. Additionally, the flow of fluid through the three or more outlets is cyclically and sequentially alternated.
Claims20
A processing system for treating a substrate comprising:
- a processing chamber configured to treat said substrate with a fluid, introduced therein, having substantially supercritical fluid properties;
- a fluid supply system coupled to said processing chamber, and configured to introduce a fluid to said processing chamber;
- a fluid flow system coupled to said processing chamber, and configured to flow said fluid through said processing chamber over said substrate;
- one or more inlets coupled to said fluid flow system, and configured to introduce said fluid to said processing chamber;
- and
- an outlet manifold coupled to said fluid flow system and having:
- three or more outlets coupled to said fluid flow system and positioned adjacent a surface of said substrate, wherein said three or more outlets are configured to remove said fluid from said processing chamber, and
- a valve manifold coupled to said three or more outlets and configured to cyclically and sequentially alter the flow of said fluid through said three or more outlets.
A method of processing a substrate in a supercritical fluid processing system comprising:
- introducing a fluid to said processing system through one or more inlets coupled to said processing system;
- and
- treating said substrate in said processing system with said fluid by bringing the fluid to a state having substantially supercritical fluid properties and exposing the substrate to the fluid in that state;
- and
- cyclically and sequentially removing said fluid from said processing system through three or more outlets coupled to said processing system and adjacent a surface of said substrate.
Dependencies are inferred from the claim text.